A critical step in advanced semiconductor manufacturing, SiO₂ etching can be performed as a wet or dry process. In wet etch processes, HF is well understood to cleave the strong Si-O bonds; however, ...
State Key Laboratory of Precision Welding & Joining of Materials and Structures, Harbin Institute of Technology, Harbin 150001, China ...
Excited to share that our latest publication in the Journal of Vacuum Science & Technology was selected as an editor’s pick! This study demonstrates the effectiveness of utilizing computational ...